| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner, an exposure method, and a device- manufacturing method for correcting a projection optical system and maintaining exposure performance, even if the projection optical system fluctuates. SOLUTION: In a projection aligner 10, positional information such as positions, inclinations, and shapes of a first mirror M1, a second mirror M2, a third mirror M3, and a fourth mirror M4 composing a projection optical system PO are measured by a mirror monitoring mechanism 80, and the positions, inclinations, shapes, and the like of the first mirror M1, the second mirror M2, the third mirror M3, and the fourth mirror M4 are corrected by an actuator, that is a correction mechanism based on the positional information obtained. |
