发明名称 |
Methods and systems for process monitoring using x-ray emission |
摘要 |
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze a cavity before being filled and then analyze emitted X-rays from the cavity after the cavity has been filled with a conductive material. Also included are system and methods for process monitoring that apply a quantitative analysis correction technique on detected X-ray emissions.
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申请公布号 |
US7365320(B2) |
申请公布日期 |
2008.04.29 |
申请号 |
US20050530178 |
申请日期 |
2005.09.12 |
申请人 |
APPLIED MATERIALS ISRAEL, LTD. |
发明人 |
SHEMESH DROR |
分类号 |
H01J37/153;G01N23/00;G21K7/00 |
主分类号 |
H01J37/153 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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