发明名称 DETERMINATION OF YOUNG'S MODULUS OF POROUS THIN FILMS USING ULTRA-LOW LOAD NANO-INDENTATION
摘要 A method and computer product program for determining Young's modulus. The method includes placing a probe in contact with a surface of a material on a substrate and, with an initial force of 800 nano newtons or less; determining the location of the surface relative to an initial indentation depth for the initial force; increasing the force on the probe from the initial force to a maximum force greater than the initial force to generate a load curve; decreasing the force on the probe from the maximum force to the initial force to generate an unload curve, the maximum force selected such that the unload curve is independent of the presence of the substrate; and using the unload curve, determining a relationship between (i) the reduced modulus of the sample material and (ii) the ratio of probe penetration depth and the thickness of the layer.
申请公布号 US2016216184(A1) 申请公布日期 2016.07.28
申请号 US201514607291 申请日期 2015.01.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 Dubois Geraud J.;Frommer Jane E.;King Robin S.;Lionti Krystelle;Virwani Kumar R.;Volksen Willli
分类号 G01N3/42 主分类号 G01N3/42
代理机构 代理人
主权项 1. A method, comprising: placing a probe in contact with a surface of a layer of a sample material on a substrate with an initial force of 800 nano newtons or less; determining the location of said surface relative to an initial indentation depth for said initial force; increasing the force on said probe from said initial force to a maximum force greater than said initial force to generate a load curve of force versus probe penetration depth; decreasing the force on said probe from said maximum force to said initial force to generate an unload curve of force versus probe penetration depth, said maximum force selected such that the unload curve is independent of the presence of said substrate; and using said unload curve, determining a relationship between (i) a reduced modulus of said sample material and (ii) the ratio of probe penetration depth and the thickness of said layer.
地址 ARMONK NY US