发明名称 |
EXPOSURE METHOD AND EXPOSURE APPARATUS |
摘要 |
<p>A substrate, a first photomask and a second photomask are highly accurately aligned. Three alignment marks (22, 25, 26) at corresponding positions on the flexible substrate (10), the first photomask (11) and the second photomask (12) are read at the same time by a CCD camera. Based on the mark position information from the read images, a relative position between the flexible substrate (10) and the first photomask (11) and that between the flexible substrate (10) and the second photomask (12) are adjusted and alignment is performed.</p> |
申请公布号 |
WO2007049640(A1) |
申请公布日期 |
2007.05.03 |
申请号 |
WO2006JP321259 |
申请日期 |
2006.10.25 |
申请人 |
SAN EI GIKEN INC.;MIYAKE, KEN;IMANISHI, KEN |
发明人 |
MIYAKE, KEN;IMANISHI, KEN |
分类号 |
G03F7/20;H05K3/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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