Polymer for forming anti-reflective coating layer and composition containing the same, and method for producing semiconductor device pattern using the same,申请号KR20060085583-传众专利搜索

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发明名称	Polymer for forming anti-reflective coating layer and composition containing the same, and method for producing semiconductor device pattern using the same
摘要
申请公布号	KR100817914(B1)	申请公布日期	2008.04.15
申请号	KR20060085583	申请日期	2006.09.06
申请人		发明人
分类号	G03F7/004;G03F7/075;G03F7/11;H01L21/027	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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