发明名称 PHOTOCURABLE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a curable composition comprising a compound having a crosslinkable silicon group, which generates no acid, has a short curing time after light irradiation and excellent storage stability before light irradiation, provides a cured product having high adhesiveness to a base material, is not cured immediately after light irradiation and can adhere an adherend even after light irradiation (has a usable life even after light irradiation) when used as an adhesive.SOLUTION: There is provided a photocurable composition which comprises (A) a compound which is not an organic polymer having a crosslinkable silicon group (provided that a compound having an Si-F bond is excluded), (B) a photo-base generator and (C) (c1) a silicon compound having an Si-F bond and/or (c2) one or more fluorine-containing compounds selected from the group consisting of boron trifluoride, a complex of boron trifluoride, a fluorinating agent and an alkali metal salt of a polyvalent fluoro-compound.SELECTED DRAWING: None
申请公布号 JP2016132704(A) 申请公布日期 2016.07.25
申请号 JP20150007294 申请日期 2015.01.16
申请人 CEMEDINE CO LTD 发明人 KONO SHOMA;YAMAYA HIROSHI;OKAMURA NAOMI
分类号 C08G77/08;C08G65/336;C08L83/04;C09J11/04;C09J11/06;C09J183/04 主分类号 C08G77/08
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