| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which significantly decreases development defects and gives an excellent square profile. <P>SOLUTION: The positive photoresist composition contains (A) a resin which contains a repeating unit having a specified partial structure with an alicyclic hydrocarbon in a side chain and a repeating unit having an alicyclic hydrocarbon in the main chain and which increases the dissolving rate with an alkali developer liquid by the effect of an acid, (B) a compound which generates an acid by radiation of active rays or radiation, and (C) a specified Meldrum's acid compound. <P>COPYRIGHT: (C)2004,JPO |
