REGION SELECTIVE DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a region selective deposition method which can exactly deposit compounds, etc., to the desired regions of a base material.

SOLUTION: A solution is brought into contact with the base material which has the first region having first surface free energy and the second region having second surface free energy to deposit the components included in this solution only in the first region. For example, a film having a photosensitive hydrophobic group is formed on a substrate and is irradiated with light to form hydrophilic patterns and the foam of the solution is brought into contact with the top of the hydrophilic patterns to deposit metal oxides on the hydrophilic patterns by the components included in the solution.

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