| 摘要 |
PURPOSE: A microlens formation method of a CMOS image sensor is provided to improve a focusing capability by using an improved microlens structure. CONSTITUTION: A first resist pattern is formed on a color filter, wherein the structure of the first resist pattern has a square shape having maximum size in the color filter. A second resist pattern having different shape compared to the square shape is then formed on the resultant structure. By flowing the first and second resist pattern, a microlens is formed.
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