SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To prevent generating of irregularity in finish of an active region when a large isolation region exists in a semiconductor device with an isolation region which is made flat by a CMP. SOLUTION: An isolation region 10 for isolating an active region 12 is provided on a semiconductor wafer. An annular dummy pattern 20 is provided to enclose the isolation region 10 in an inactive region which exceeds a prescribed size. An isolation region which does not exceed a prescribed width is ensured between the dummy pattern 20 and the active region 12 surrounding the inactive region.