发明名称 CURABLE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a curable composition with high definition and excellent light blocking properties favorable for black matrix formation by achieving both high sensitivity and chemical resistance.SOLUTION: A curable composition contains: an ethylenically unsaturated compound (A), which is a reaction product obtained by an esterification reaction of a polybasic acid anhydride with an epoxy addition compound having a structure where an unsaturated monobasic acid is added to an epoxy compound having a phenylindane skeleton represented by the general formula (I) in the figure; and an oxime ester based polymerization initiator (B) having a specific structure.SELECTED DRAWING: None
申请公布号 JP2016090797(A) 申请公布日期 2016.05.23
申请号 JP20140224844 申请日期 2014.11.05
申请人 ADEKA CORP 发明人 ISHIGURO TOMOHITO;SHINAGAWA MASUMI;SHINOZUKA TOYOJI
分类号 G03F7/027;C08G59/16;C08K5/29;C08L63/10;G02B5/20;G03F7/004;G03F7/031;G03F7/075 主分类号 G03F7/027
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