发明名称 アバランシェフォトダイオードおよびその製造方法
摘要 PROBLEM TO BE SOLVED: To enable configuring a multiplication layer of an avalanche photodiode from a semiconductor in which holes are not ionized at the time of applying a voltage.SOLUTION: An avalanche photodiode includes a p-type first contact layer 102 formed on a substrate 101, an n-type second contact layer 103 formed above the substrate 101, and a light absorption layer 104 formed between the first contact layer 102 and the second contact layer 103. The avalanche photodiode further includes a multiplication layer 105 formed between the light absorption layer 104 and the second contact layer 103, an n-type electric-field control layer 106 formed between the light absorption layer 104 and the multiplication layer 105, and a reflection structure layer 107 formed between the light absorption layer 104 and the multiplication layer 105. The multiplication layer 105 is composed of a compound semiconductor in which holes are not ionized at the time of applying a voltage.
申请公布号 JP6030416(B2) 申请公布日期 2016.11.24
申请号 JP20120250945 申请日期 2012.11.15
申请人 日本電信電話株式会社 发明人 名田 允洋;村本 好史;横山 春喜;井田 実
分类号 H01L31/107 主分类号 H01L31/107
代理机构 代理人
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