Method of forming pattern

摘要

According to one embodiment, a method of forming a pattern includes applying a polymer material having a first segment and a second segment in openings formed in a guide, heating the polymer material to achieve microphase separation of the polymer material to form a self-assembled pattern which includes a first polymer portion having a cylindrical shape which includes the first segment, and a second polymer portion including the second segment and surrounding a lateral portion of the first polymer portion, and selectively removing the first polymer portion. A molecular weight ratio of the first segment to the second segment in the polymer material is approximately 4:6.

主权项

1. A method of forming a pattern, comprising:
forming a pattern having an opening on a film to be processed; depositing a polymer material having a first polymer segment and a second polymer segment in the opening; heating the polymer material to achieve microphase separation of the polymer material into a first polymer phase portion including the first polymer segment, and a second polymer phase portion including the second polymer segment, the first polymer phase portion including an upper portion having a rectangular plate shape with rounded corners and a plurality of lower portions each of which extends from the upper portion as a cylindrical shape, and the second polymer phase portion surrounding the first polymer phase portion; and selectively removing the first polymer phase portion, wherein molecular weights of the first polymer segment and the second polymer segment satisfy the following formula:
37/63≦(the molecular weight of the first polymer segment)/(the molecular weight of the second polymer segment)≦42/58.