| 摘要 |
PROBLEM TO BE SOLVED: To precisely avoid overlapping deviations of projection patterns by shift or rotation of a mask image without degrading a throughput. SOLUTION: Locations X, Yθof a reticle R containing a base line BL are measured at t1, t2 are measured (S1, S2). From measurement results, location change amountsΔX,ΔY,Δθof the reticle R due to thermal expansion between t1 and t2 are calculated (S3). A thermal expansion amount of the reticle R at t1, t2 is calculated (S4). From thermal expansion amount changeΔQ and the locating change amountsΔX,ΔY,Δθof the reticle R between t1 and t2 obtained from these thermal expansion amounts, proportional coefficients for the thermal expansion amountsΔX/ΔQ,ΔY/ΔQ,Δθ/ΔQ are calculated (S5). After t2, the thermal expansion amounts of the reticle R are calculated (SA), and this is multiplied by the change ratio to estimate the location change amounts of the reticle R (SB). A reticle location is corrected based on this estimated result (SD). |
