| 摘要 |
PROBLEM TO BE SOLVED: To enhance the throughput without contact (interference) between two stages, and without influence of one stage operations exerting on the other stage operations. SOLUTION: Two wafer stages WS1, WS2 can be moved independently and two-dimensionally on a base boad 12, and while wafer replacement and alignment are made on the wafer stage WS1 under an alignment system 24a, a wafer W2 on the wafer stage WS2 under a projection optical system PL is exposed to lights. A main control device 90 makes synchronously both operations under influences, and makes synchronously both operations under no influences among openations made on the wafer stages WS1, WS2. Further, the main control device 90 grasps locations of both stages by an interferometer system based on interference conditions while performing location control, whereby interference between both the stages can be prevented. |
