发明名称 |
AUTOMATIC FOCUSED ION BEAM IMAGING SYSTEM AND METHOD |
摘要 |
A method of imaging an integrated circuit using a focused ion beam system i s presented. According to the method an integrated circuit is imaged in plan- view using a focused ion beam system. Circuit information is then extracted absent processing. In another embodiment, a method and system for imaging an entire IC automatical ly without removing the IC from the imaging system and requiring minimal operat or intervention is presented. The method employs a focused ion beam system to image an exposed layer of an integrated circuit and then to etch a portion of the exposed layer in situ. Imaging and etching are repeated until substantially the entire integrated circuit is imaged. A processor is used to assemble the layers into a three-dimensional topography of the integrated circuit. Because of known relationships between layers, th e mosaicing is facilitated and the final topography is more reliable than those produced by currently known computer implemented methods.
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申请公布号 |
CA2260440(C) |
申请公布日期 |
2007.08.28 |
申请号 |
CA19992260440 |
申请日期 |
1999.01.28 |
申请人 |
CHIPWORKS |
发明人 |
BRETON, PIERRETTE;ELVIDGE, JULIA;LUDLOW, TERRY;PHANEUF, MICHAEL;SKOLL, DAVID;WEAVER, LOUISE;SOCRANSKY, BRYAN;JAMES, DICK;HAYTHORNTHWAITE, RAY |
分类号 |
G01R31/303;G01N23/04;G01N23/225;G01Q30/04;G01R31/302;G01R31/307;G06K9/00;H01J37/28;H01J49/26 |
主分类号 |
G01R31/303 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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