| 主权项 |
1. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
a projection optical system which has a plurality of optical elements, and which projects the image of the pattern onto the substrate; an imaging controller having a mover which moves a part of the plurality of optical elements; a stage system having a substrate stage on which the substrate is held, the substrate stage being movable below and relative to the projection optical system; a supply port via which the liquid is supplied to a space under the projection optical system; a recovery port which recovers the liquid supplied to the space; a temperature sensor which measures a temperature of the liquid recovered via the recovery port; and a controller which controls at least one of the imaging controller and the stage system, wherein a liquid immersion area smaller than an area of an upper surface of the substrate is formed locally in the space by supplying the liquid via the supply port and by recovering the liquid from the liquid immersion area via the recovery port, and the controller controls at least one of the imaging controller and the stage system based on a result of the measurement performed by the temperature sensor. |
