| 摘要 |
There is provided an exposure method including the steps for arranging an object to be exposed and a transparent plate that includes a thin film, within such a range that near field light from the thin film may operate on the object, the thin film having a light transmittance that changes according to an intensity of light of incidence, and exposing the object with the near field light generated by projecting a pattern on a mask onto the thin film of the transparent plate.
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