发明名称 MANUFACTURING METHOD FOR SUBSTRATE FOR PLANOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a substrate for a planographic printing plate capable of obtaining an original plate for the planographic printing plate excellent in either of scumming resistance and printing resistance. <P>SOLUTION: In this manufacturing method for the substrate for the planographic printing plate, the substrate for the planographic printing plate is obtained by making an aluminum plate subjected to at least first electrochemical surface-roughening treatment using an alternating current in an aqueous solution containing a hydrochloric acid, etching treatment in an alkaline aqueous solution, and second electrochemical surface-roughening treatment using an alternating current in an aqueous solution containing a hydrochloric acid, in this order. Either of power supply waveforms of the alternating currents for use in the first electrochemical surface-roughening treatment and the second electrochemical surface-roughening treatment is a sine wave, and a frequency of the alternating current for use in the second electrochemical surface-roughening treatment is higher than a frequency of the alternating current for use in the first electrochemical surface-roughening treatment. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005047070(A) 申请公布日期 2005.02.24
申请号 JP20030204389 申请日期 2003.07.31
申请人 FUJI PHOTO FILM CO LTD 发明人 NISHINO ATSUO;SAWADA HIROKAZU;UESUGI AKIO
分类号 G03F7/09;B41N3/03;C23F1/00;C25D11/16;C25F3/04;G03F7/00 主分类号 G03F7/09
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