REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS
摘要
A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25°C, and the first polymerized layer is substantially impermeable to the second polymerizable composition.
申请公布号
WO2009029246(A1)
申请公布日期
2009.03.05
申请号
WO2008US10063
申请日期
2008.08.25
申请人
MOLECULAR IMPRINTS, INC.
发明人
XU, FRANK, Y.;LIU, WEIJUN;BROOKS, CYNTHIA, B.;LABRAKE, DWAYNE, L.;LENTZ, DAVID., J.