发明名称 METHOD FOR CONTROLLING ORIENTATION OF OXIDE CERAMIC THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for controlling the orientation of an oxide ceramic thin film in depositing the oxide ceramic thin film onto metal by using a high-temperature plasma containing oxygen. SOLUTION: The orientation of the oxide ceramic thin film can be controlled on Pt by disposing a substrate 106 in plasma flame 105 and adjusting the substrate to the desired position.
申请公布号 JP2002155377(A) 申请公布日期 2002.05.31
申请号 JP20000348505 申请日期 2000.11.15
申请人 SEIKO EPSON CORP 发明人 IWASHITA SETSUYA;HIGUCHI AMAMITSU;MIYAZAWA HIROSHI
分类号 H05H1/46;C23C16/40;C23C16/507;C23C26/00 主分类号 H05H1/46
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