发明名称 |
METHOD FOR CONTROLLING ORIENTATION OF OXIDE CERAMIC THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for controlling the orientation of an oxide ceramic thin film in depositing the oxide ceramic thin film onto metal by using a high-temperature plasma containing oxygen. SOLUTION: The orientation of the oxide ceramic thin film can be controlled on Pt by disposing a substrate 106 in plasma flame 105 and adjusting the substrate to the desired position. |
申请公布号 |
JP2002155377(A) |
申请公布日期 |
2002.05.31 |
申请号 |
JP20000348505 |
申请日期 |
2000.11.15 |
申请人 |
SEIKO EPSON CORP |
发明人 |
IWASHITA SETSUYA;HIGUCHI AMAMITSU;MIYAZAWA HIROSHI |
分类号 |
H05H1/46;C23C16/40;C23C16/507;C23C26/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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