发明名称 SUBSTRATE WASHING APPARATUS AND TOOL
摘要 PROBLEM TO BE SOLVED: To provide a substrate washing apparatus provided with a sensor for detecting the presence of the washing member of a washing tool, and the washing tool preventing the falling-off of the washing member from a grasping part. SOLUTION: In the substrate washing tool equipped with a washing instrument mounting mechanism 20 provided with the washing tool 21 having the washing member coming into contact with the washing a surface of a substrate Wf to be washed and bringing the washing member of the washing instrument 21 into contact with the substrate Wf to be washed held and rotated by a substrate holding and rotating mechanism to wash the substrate Wf to be washed, a washing member sensor (floodlight projector 27a, photodetector 27b) for detecting the washing member of the washing tool 21 in such a state that the washing tool 21 mounted on the washing instrument mounting mechanism 20 is present at a predetermined position is provided.
申请公布号 JP2002028584(A) 申请公布日期 2002.01.29
申请号 JP20000214250 申请日期 2000.07.14
申请人 EBARA CORP 发明人 OIKAWA FUMITOSHI;ATO KOJI
分类号 B08B1/00;B08B1/04;B08B3/02;B08B3/04;B08B7/04;H01L21/00;H01L21/304;H01L21/68;(IPC1-7):B08B1/04 主分类号 B08B1/00
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