| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition having a large EL margin and capable of forming a resist pattern of a good profile, and to provide a resist pattern forming method. <P>SOLUTION: The resist composition contains a resin component (A), of which the alkali solubility increases by the action of an acid and an acid generator component (B) which generates an acid upon exposure to light, wherein the resin component (A) contains a resin (A1), having a constitutional unit (a1) represented by Formula (a1) and a constitutional unit (a2) represented by Formula (a2) [wherein R<SP>1</SP>is an acid decomposable group represented by Formula (I)], and wherein the acid generator component (B) contains an onium salt (B1), having an anionic moiety represented by Formula (b-5) [wherein U", V" and W", each independently represent a 1-10C alkyl group, in which at least one H atom has been substituted by an F atom]. <P>COPYRIGHT: (C)2008,JPO&INPIT |
