CLEANING METHOD

摘要

In a jig used in a CVD device or a dry etching device, processing in a chamber causes adhesion of an accumulated film. When ignored, the accumulated film is a factor in reduced spark generation and precision, and quality degradation such as particle contamination. The present invention is a method for cleaning the jig of a vacuum processing device, the cleaning method characterized by including a step for immersing the jig in a tetramethylammonium hydroxide solution, a step for immersing the jig in a nitric acid solution, and a step for cleaning the jig using purified water.