发明名称 |
DEFINED DOSING ATMOSPHERIC TEMPERATURE AND PRESSURE VAPOR DEPOSITION SYSTEM |
摘要 |
A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system. The chemical vapor deposition system may include a treatment chamber, a conveyor, a compressed clean air system to provide separate treatment compartments within the chamber, a moisture system, a chemical vapor system, and a neutralization system to neutralize harmful byproducts. |
申请公布号 |
EP2989228(A4) |
申请公布日期 |
2016.12.14 |
申请号 |
EP20140788444 |
申请日期 |
2014.04.23 |
申请人 |
Diamon-Fusion International, Inc. |
发明人 |
SLAYBAUGH, Russell, C.;METCALFE, Michael, Stephen;ZAX, Adam;SETA, Guillermo |
分类号 |
C23C16/448;B67D7/02;C23C16/44 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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地址 |
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