发明名称 METALLIC NICKEL OR NICKEL-BASE ALLOY, HAVING SURFACE CONTROLLED AT ATOMIC LEVEL, AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain metallic nickel or nickel-base alloy, having a surface flattened at an atomic level and used for magnetic recording material, sensor, catalytic material, battery material, etc. SOLUTION: Metallic nickel or nickel base alloy is used as a working electrode and immersed in an acidic aqueous solution, and the electrode potential of the working electrode is swept in the range where the upper limit is set at a potential further nobler by 0.2 V than the open circuit potential and the lower limit at a base potential of <=-0.5 V on the basis of saturated calomel reference electrode, and electrolytic etching and electrolytic deposition are repeated, by which the metallic nickel or nickel-base alloy is produced. For working, it is preferable to repeat electrolytic etching and electrolytic deposition while observing the surface condition of the metallicnic nickel or nickel-base alloy by an electrochemical scanning tunneling microscope. By this method, the metallic nickel or nickel-base alloy, where a specific-index plane alone is allowed to appear at the whole surface part and which has a flat terrace of >=10 nm free from defects on an atomic scale and has an extremely flattened surface free from step of >=5 atoms in an arbitrary region, can be obtained.
申请公布号 JPH1129900(A) 申请公布日期 1999.02.02
申请号 JP19970183295 申请日期 1997.07.09
申请人 RES DEV CORP OF JAPAN 发明人 ANDO SATOSHI;SUZUKI TAKESHI;ITAYA KINGO
分类号 C23C30/00;C22C19/03;C23F17/00;C25C1/08;C25F3/02;G11B5/73;G11B5/84;H01F1/04;H01F10/08;H01F10/14;H01F10/32 主分类号 C23C30/00
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