TREATMENT APPARATUS FOR SUBSTRATE BY IRRADIATION WITH LIGHT

摘要

PURPOSE:To avoid a state that a substrate is heated at a higher temperature than required without spoiling the uniform heating property of a heating plate. CONSTITUTION:A heating plate 12 which is provided with a sheetlike heater 10 and whose upper edge has a heating face H whose area is equal to, or more than, the area of a substrate W and an ultraviolet lamp 16 which heats the substrate W from its upper part are installed inside a treatment chamber 9. In addition, a water-cooled jacket 20 which has a ringed cooling face C surrounding the heating face H of the heating plate 12 is installed.