| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing a resist of the end of a glass substrate, which does not generate resist residues in the end where a coating film is selectively dissolved/removed. SOLUTION: In the method for processing the end surface using a processing head 10 which selectively dissolves/removes a coating film 2 in the end of a glass substrate 40, (1) two-fluid nozzles 20A, 20B are prepared in a discharge opening prepared above and below a route 56 of the glass substrate in the processing head, when the end of the glass substrate is positioned in a processing liquid reservoir 51, (2) after dissolving/removing selectively the coating film of the end of the glass substrate, the end of the glass substrate is cleaned by the two-fluid cleaning with pure water and clean air using the two-fluid nozzles. COPYRIGHT: (C)2008,JPO&INPIT
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