发明名称 Substrates processing device
摘要 A substrates processing device having a tank in which process solution is contained, a bottle communicated with the tank through a conduit and located above an object to be processed with the process solution supplied, a nozzle located under the bottle, a support for supporting the object to be processed, and a changeover device for making pressure in it negative through a conduit when the process solution is to be added to it and also making pressure in it normal through the conduit when the process solution is to be supplied to the nozzle.
申请公布号 US5405443(A) 申请公布日期 1995.04.11
申请号 US19930051554 申请日期 1993.04.23
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON KYUSHU LIMITED;KABUSHIKI KAISHA TOSHIBA 发明人 AKIMOTO, MASAMI;GOTOU, KAZUYUKI;ITO, YASUSHI;OKUMURA, KATSUYA
分类号 B05C11/08;B05C11/10;G03F7/16;G03F7/30;H01L21/00;H01L21/027;H01L21/30;(IPC1-7):B05C5/00 主分类号 B05C11/08
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