发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.
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申请公布号 |
US7034924(B2) |
申请公布日期 |
2006.04.25 |
申请号 |
US20040754634 |
申请日期 |
2004.01.12 |
申请人 |
ASLM NETHERLANDS B.V. |
发明人 |
VAN DER SCHOOT HARMEN KLASS;JACOBS HERNES;TERKEN MARTINUS ARNOLDUS HENRICUS |
分类号 |
G03B27/60;G03F7/20 |
主分类号 |
G03B27/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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