发明名称 |
METHOD AND SYSTEM FOR MODIFYING AND DENSIFYING A POROUS FILM |
摘要 |
The invention provides a system and a method for densifying a surface of a porous film. By reducing the porosity of a film, the method yields a densified film that is more impenetrable to subsequent liquid processes. The method comprises the steps of providing a film having an exposed surface. The film can be supported by a semiconductor substrate. When the film is moved to a processing position, a focused source of radiation is created by a beam source. The exposed surface of the film is then irradiated by the beam source at the processing position until a predetermined dielectric constant is achieved. The film or beam source may be rotated, inclined, and/or moved between a variety of positions to ensure that the exposed surface of the film is irradiated evenly.
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申请公布号 |
US2001038889(A1) |
申请公布日期 |
2001.11.08 |
申请号 |
US19990232359 |
申请日期 |
1999.01.15 |
申请人 |
PANGRLE SUZETTE K.;HUANG RICHARD;PRAMANICK SHEKHAR |
发明人 |
PANGRLE SUZETTE K.;HUANG RICHARD;PRAMANICK SHEKHAR |
分类号 |
H01L21/3105;H01L21/314;H01L21/316;(IPC1-7):B05D3/06;C08J7/04;C08J7/18 |
主分类号 |
H01L21/3105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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