Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition,申请号EP20060001603-传众专利搜索

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发明名称	Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
摘要
申请公布号	EP1688791(A3)	申请公布日期	2008.04.16
申请号	EP20060001603	申请日期	2006.01.26
申请人	FUJIFILM CORPORATION	发明人	WADA, KENJI
分类号	G03F7/004;G03F7/038;G03F7/039	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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