| 摘要 |
An objective of the present invention is to provide a metal-insulator-metal capacitor having high capacitance. The metal-insulator-metal capacitor comprises: a dummy insulation layer pattern arranged on a lower structure having a capacitor area and an edge area enclosing the capacitor area, and provided with a plurality of contact holes to expose the lower structure in the capacitor area; a lower metal layer pattern arranged on an upper surface of the dummy insulation layer pattern, a side surface of the dummy insulation layer pattern forming an inner wall of each of the contact holes, and an exposed surface of the lower structure exposed by each of the contact holes, in the capacitor area, so as to expose the upper surface of the dummy insulation layer pattern of the edge area; a dielectric layer pattern arranged on the lower metal payer pattern of the capacitor area, and extended from a boundary portion of the capacitor area and the edge area to the edge area by a prescribed distance; and an upper metal layer pattern arranged on the dielectric layer pattern of the capacitor area, and extended from the boundary portion of the capacitor area and the edge area to the edge area by a prescribed distance. |
