发明名称 |
METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT AND MANUFACTURING SYSTEM FOR THE SAME |
摘要 |
Provided are a method of manufacturing a magnetoresistive element and a manufacturing system which are capable of manufacturing a magnetoresistive element achieving further downscaling, i.e., further increase in the degree of integration of the magnetoresistive element while having high magnetic properties. The method includes: preparing a stacked film including one of the two magnetic layers, a layer to form the tunnel barrier layer, and the other of the two magnetic layers, on a substrate; forming multiple separated stacked films on the substrate by separating the stacked film into the multiple stacked films by etching; irradiating side portions of the multiple separated stacked films with ion beams in a pressure-reducible process chamber; and after the irradiation with the ion beams, forming oxide layers or nitride layers on surfaces of the multiple stacked films by introducing an oxidizing gas or a nitriding gas into the process chamber. |
申请公布号 |
US2016204342(A1) |
申请公布日期 |
2016.07.14 |
申请号 |
US201615075409 |
申请日期 |
2016.03.21 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
Hayashi Marie;Sakamoto Kiyotaka;Ikeda Masayoshi |
分类号 |
H01L43/12;H01L43/08;H01L43/10;H01L43/02 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a magnetoresistive element in which a tunnel barrier layer is provided between two magnetic layers, the method comprising the steps of:
preparing a stacked film on a substrate, the stacked film including one of the two magnetic layers, a layer to form the tunnel barrier layer, and the other of the two magnetic layers; forming a plurality of separated stacked films on the substrate by separating the stacked film into the plurality of stacked films by etching; irradiating side portions of the plurality of separated stacked films with ion beams in a pressure-reducible process chamber; and after the irradiation with the ion beams, forming oxide layers or nitride layers on surfaces of the plurality of stacked films by introducing an oxidizing gas or a nitriding gas into the process chamber. |
地址 |
Kawasaki-shi JP |