发明名称 EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To suppress a shade of a shutter edge part from becoming obscure and unclear on the surface of a body to be exposed. <P>SOLUTION: An exposure apparatus includes: a conveying means 1 for conveying a color filter substrate 9 in which a plurality of exposure regions are arranged at least in a row in the setting direction; a mask stage 2 for holding a photomask 13; an always lighting light source 3 during exposure to the color filter substrate 9; and a shutter 4 for exchanging radiation and interception of exposure light by allowing the plurality of the exposure regions of the color filter substrate 9 to synchronize to successively pass the lower side of the photomask 13. The exposure apparatus includes: a fly eye lens 5 disposed between the light source 3 and shutter 4 and uniforming brightness distribution of the exposure light irradiating the photomask 13; a condenser lens 6 for imaging to superpose images of a plurality of microlenses of the fly eye lens 5 on the interception face of the exposure light by the shutter 4; and an offner optical system 7 for re-imaging the images of the plurality of the microlenses imaged to be superposed on the photomask 13. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009058666(A) 申请公布日期 2009.03.19
申请号 JP20070224628 申请日期 2007.08.30
申请人 V TECHNOLOGY CO LTD 发明人 KAJIYAMA KOICHI;ISHII DAISUKE;HATANAKA MAKOTO
分类号 G03F7/20 主分类号 G03F7/20
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