CARBOXYLIC ACID DERIVATIVES AND PROCESS FOR PREPARATION THEREOF

摘要

PURPOSE: A novel carboxylic acid derivatives for improving the antietching property of pattern profiles of a resist containing conventional carboxylic acid derivatives as a main component or an additive and capable of being easily decomposed by an acid as compared to conventional t-butyl ester compounds and insoluble in a basic aqueous solution and process for preparation thereof are provided which can improve pattern profiles of a resist by improving a residual film rate and acting as a melting inhibitor at an unexposure section and acting as a melting accelerator at an exposure section. CONSTITUTION: The novel carboxylic acid derivatives represented by the following formula I are prepared by reaction of one or more compounds selected from halogen compounds of the formula: R1-CHX2 and one or more compounds selected from carboxylic compounds of the formula: R2-H in the presence of a basic catalyst at -80 to 150deg.C for 0.5 to 15 hr. In formula, R1 is H, C1-20 linear, branched or cyclic alkyl or alkoxy, R2 is C1-40 nonsubstititued carbon atoms in a linear, branched or cyclic carboxyl.