发明名称 |
Nail polish remover composition and its use |
摘要 |
The present invention relates to a water based nail polish remover composition comprising an anionic surfactant, a water soluble solvent, and water; wherein the anionic surfactant is selected from the group consisting of secondary C6-C22-alkane sulfonate trialcohol amine salts and mixtures thereof. The invention also relates to the use of the composition for removing nail polish. |
申请公布号 |
US9399005(B2) |
申请公布日期 |
2016.07.26 |
申请号 |
US201214006363 |
申请日期 |
2012.03.21 |
申请人 |
OY FAINTEND LTD |
发明人 |
Valkonen Jan;Kivioja Martti |
分类号 |
C11D1/12;C11D3/43;C11D3/44;A61K8/33;C11D3/20;C11D3/34;C11D1/14;A61K8/34;A61Q3/04;A61K8/39;A61K8/46 |
主分类号 |
C11D1/12 |
代理机构 |
Scully Scott Murphy and Presser |
代理人 |
Scully Scott Murphy and Presser |
主权项 |
1. A nail polish remover composition consisting of an anionic surfactant, a water soluble solvent, water and optionally one or more C1-C10 alcohol(s), which may be unsubstituted or substituted with one or more C1-C3-alkoxy group(s); wherein the anionic surfactant is selected from the group consisting of secondary C6-C22-alkane sulfonate trialcohol amine salts and mixtures thereof, and wherein the water soluble solvent is a glycol ether; a C2-C8-alkylene or di-C2-C8-alkylene glycol, or a C1-C6-alkyl ether thereof; or a mixture thereof. |
地址 |
Salo FI |