发明名称 DIFFRACTION SPECTRAL FILTER FOR USE IN EXTREME-UV LITHOGRAPHY CONDENSER
摘要 A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.
申请公布号 KR100822881(B1) 申请公布日期 2008.04.17
申请号 KR20037001587 申请日期 2003.02.04
申请人 发明人
分类号 G02B5/20;(IPC1-7):G02B5/20 主分类号 G02B5/20
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