SEMICONDUCTOR TREATMENT SYSTEM, AND BUBBLE TRAP

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor treatment system which is high in versatility and in which the flow rate of a raw material liquid can accurately be performed, and to provide a bubble trap therefor. SOLUTION: The semiconductor treatment system comprises a liquid feed tube 34 for feeding a raw material liquid sent out by pressurized gas into a treatment chamber 12. The liquid feed tube 34 is provided with a vaporizer 22 and an MFC (mass flow controller) 24. In the upstream and also in the vicinity of the MFC 24, the liquid feed tube 34 is provided with a bubble trap 26. The bubble trap 26 comprises a separator chamber 44 for separating the bubbles of the pressurized gas coexistent in the raw material liquid originating in the pressurized gas from the raw material liquid. The separator chamber 44 comprises a liquid inlet 46 for introducing the raw material liquid and a liquid outlet 48 for exhausting the raw material liquid at the lower part, and further comprises a gas outlet 52 for exhausting the gas separated from the raw material liquid at the upper part. COPYRIGHT: (C)2005,JPO&NCIPI