PROCESS FOR REMOVING RESIDUAL SPIN SOLVENT FROM A GEL SPUN FILAMENT, THE FILAMENT, MULTI-FILAMENT YARN AND PRODUCTS COMPRISING THE FILAMENT

摘要

Processes for removing residual spin solvent from a gel spun, UHMwPE filament having an effective diameter of above 16 μm, comprise the steps of removing residual spin solvent from the filament to a level of below 100 ppm at elevated temperature, while keeping the filament taut. Gel spun UHMwPE filaments having an effective diameter of above 16 μm and a residual spin solvent residue of less than 100 ppm are also provided. Preferably the filament has a creep rate, measured at 50° C., under a load, so that the initial stress is 600 MPa, of less than 5·10−6 sec−1.

主权项

1. A process for removing residual spin solvent from a gel spun, UHMwPE filament, comprising the steps of:
(a) providing a gel spun UHMwPE filament having a titer of 2-100 dtex, and a residual spin solvent content of between 100 and 2000 ppm, (b) winding the filament provided in step a) around a frame such that the filament is kept taut with a tension of above 0.15 g/dtex, and (c) removing residual spin solvent from the filament by subjecting the filament around a frame of step b) to an elevated temperature above 80° C. and below 140° C., to obtain a treated UHMwPE filament having a residual solvent level of below 60 ppm.