| 摘要 |
A semiconductor apparatus in which a substantially entire channel region being a partial depletion type comprises a semiconductor layer provided on one surface side of a substrate, a channel region having a first electroconductive type provided in the semiconductor layer, a high-concentration diffusion region having a second electroconductive type provided in the semiconductor layer being adjacent to the channel region, facing both sides of the channel region, and being separated, a body terminal having the first electroconductive type which is connected with the channel region to fix a potential of the channel region, an insulator provided on the channel region, a gate electrode provided on the insulator to cover the channel region, and a channel edge portion disposed at an end portion of the channel region and also at an end portion of the semiconductor layer, and containing an impurity having the first electroconductive type therein.
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