发明名称 TRENCH PROCESS AND STRUCTURE FOR BACKSIDE CONTACT SOLAR CELLS WITH POLYSILICON DOPED REGIONS
摘要 A solar cell includes polysilicon P-type and N-type doped regions on a backside of a substrate, such as a silicon wafer. A trench structure separates the P-type doped region from the N-type doped region. Each of the P-type and N-type doped regions may be formed over a thin dielectric layer. The trench structure may include a textured surface for increased solar radiation collection. Among other advantages, the resulting structure increases efficiency by providing isolation between adjacent P-type and N-type doped regions, thereby preventing recombination in a space charge region where the doped regions would have touched.
申请公布号 US2016343890(A1) 申请公布日期 2016.11.24
申请号 US201615230153 申请日期 2016.08.05
申请人 SunPower Corporation 发明人 SMITH David D.
分类号 H01L31/0224;H01L31/0216;H01L31/0368;H01L31/0352;H01L31/0236;H01L31/02 主分类号 H01L31/0224
代理机构 代理人
主权项 1. A solar cell comprising: a solar cell substrate having a front side configured to face the sun during normal operation and a backside opposite the front side; a P-type doped region and an N-type doped region of the solar cell over the backside of the solar cell substrate; a trench between the P-type doped region and the N-type doped region, the trench physically separating the P-type doped region from the N-type doped region and extending into the solar cell substrate; a first metal contact finger that is electrically connected to the P-type doped region; and a second metal contact finger that is electrically connected to the N-type doped region.
地址 San Jose CA US