发明名称 |
Substrate temperature control system and method for controlling temperature of substrate |
摘要 |
To provide a substrate temperature control system capable of unifying the temperature of the substrate and capable of shortening the temperature elevation time (temperature lowering time), the substrate temperature control system is equipped with a temperature control plate (heating or cooling plate) having a plurality of projections on its surface and acting to set the temperature of the substrate. A chuck mechanism is provided to fix the substrate in contact with a plurality of the projections by chucking the substrate toward the temperature control plate.
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申请公布号 |
US6394797(B1) |
申请公布日期 |
2002.05.28 |
申请号 |
US20000526460 |
申请日期 |
2000.03.16 |
申请人 |
HITACHI, LTD. |
发明人 |
SUGAYA MASAKAZU;MURAI FUMIO;KANEKO YUTAKA;KANETOMO MASAFUMI;HIRASAWA SHIGEKI;WATANABE TOMOJI;YAMAMOTO TATUHARU;KURODA KATSUHIRO |
分类号 |
H01L21/027;H01L21/00;(IPC1-7):F27D5/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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