发明名称 |
Multi-level optical structure and method of manufacture |
摘要 |
A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the feature below the baseline level. The distance has an accuracy inn the range of approximately ±0.05 mum to less than approximately ±1.0 mum. A method of fabricating an optical device includes forming at least one feature at a level of above a baseline level of a substrate; and forming at least one feature at a baseline level below the baseline level of the substrate, wherein the feature at a level above the baseline level and the feature at a level below the baseline level are patterned in a single-mask step using a multi-level mask.
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申请公布号 |
US2008050582(A1) |
申请公布日期 |
2008.02.28 |
申请号 |
US20070891721 |
申请日期 |
2007.08.13 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
STEINBERG DAN A.;SHERRER DAVID W. |
分类号 |
B32B17/00;G02B6/12;G02B6/136;G02B6/30;G03F1/14 |
主分类号 |
B32B17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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