发明名称 MASKING SYSTEMS AND METHODS
摘要 Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.
申请公布号 WO2016100860(A3) 申请公布日期 2016.08.18
申请号 WO2015US66765 申请日期 2015.12.18
申请人 PDS IG HOLDING LLC 发明人 TRPKOVSKI, Paul
分类号 B32B17/10 主分类号 B32B17/10
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