发明名称 Apparatus for electroplating a tooling for use in semiconductor device encapsulation
摘要 An apparatus is disclosed for electroplating an inside wall of a transfer mold, the transfer mold being suitable for use in semiconductor device encapsulation. Specifically, the apparatus comprises a fixture, as well as a through-hole in the fixture for receiving an electrode to electroplate the inside wall of the transfer mold. In particular, the through-hole is configured to receive the electrode in a slide-fit to form a mutual interference fit for securing the electrode to the fixture. Upon fitting the electrode into the through-hole, the apparatus can then be used to electroplate the inside wall of the transfer mold by introducing the electrode into the space adjacent to the inside wall of the transfer mold. A device for use as an electrode in the apparatus is also disclosed.
申请公布号 US9487881(B2) 申请公布日期 2016.11.08
申请号 US201113184675 申请日期 2011.07.18
申请人 ASM TECHNOLOGY SINGAPORE PTE LTD 发明人 Ho Shu Chuen;Yip Kai Fat;Chng Eng Cheng;Ngo Yew Lan;Damodaran Saravana Ranganathan
分类号 C25D5/02;C25D7/04;C25D17/12;C25D17/06;C25D1/02;C25D17/00 主分类号 C25D5/02
代理机构 Ostrolenk Faber LLP 代理人 Ostrolenk Faber LLP
主权项 1. An apparatus for electroplating inside walls of a plurality of gates of a transfer mold, the transfer mold being for encapsulating semiconductor devices, the apparatus comprising: a plurality of electrodes configured to act as anodes during electroplating, each electrode of the plurality of electrodes comprising: a head portion; and a shaft portion configured to be inserted into a respective interior space of a gate of the transfer mold; a fixture; and a plurality of through-holes in the fixture, each through-hole comprising: a counterbore configured to engage with the head portion of a respective electrode to prevent further entry of the electrode into the through-hole; and a bore for receiving the shaft portion of the respective electrode configured to electroplate the inside wall of the respective gate of the transfer mold, wherein diameters of the bores of the through-holes are smaller than the diameters of the shaft of the electrodes, and the bores of the through-holes receive the shaft of the electrodes in a slide-fit to form a mutual interference fit to thereby secure the electrodes to the fixture, wherein the shaft portions of the electrodes are configured to protrude from the fixture.
地址 Singapore SG