| 摘要 |
PURPOSE:To provide a polishing device capable of improving flatness microscopically by way of uniforming the contact state of an abrasive cloth surface and a sample polished surface, improving flatness of a sample and uniforming a polishing amount to the sample polished surface macroscopically. CONSTITUTION:On the opposite side of a sample holding pedestal 3 free to rotate, placing a sample B on it, a rotatable polishing disc 1 is arranged, and on its bottom face, an abrasive cloth 2 is affixed through an elastic body 201. Polish is carried out as the polishing disc 1 and the sample holding pedestal 3 rotate, an abrasive 8 is supplied between the abrasive cloth 2 and the sample polished surface and the abrasive cloth 2 makes contact with the sample B in a narrow range. |
