发明名称 |
CORROSION-RESISTANT ELECTROSTATIC CHUCK |
摘要 |
<p>PURPOSE: To reduce an electrostatic stacked area exposed to plasma by removing an electrostatic stacked strap area extending beyond a pedestal tip part. CONSTITUTION: An electrostatic chuck is provided for fixing a semiconductor substrate 8 to a prescribed position within a processing chamber. A non-reactive gas is connected (ported) to an area near the end part of the dielectric part of the chuck through a pedestal to protect the end part of the dielectric part from erosion caused by a processing area.</p> |
申请公布号 |
JPH0855903(A) |
申请公布日期 |
1996.02.27 |
申请号 |
JP19950033877 |
申请日期 |
1995.02.22 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
SHIYAMOIRU SHIYAMOIRIAN;MANUUCHIYAA BIRANGU;SEMIYON SHIYAASUTEINSUKII;SATSUSON SOMEKUU |
分类号 |
B23Q3/15;C23C16/44;C23C16/455;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 |
主分类号 |
B23Q3/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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