发明名称 CORROSION-RESISTANT ELECTROSTATIC CHUCK
摘要 <p>PURPOSE: To reduce an electrostatic stacked area exposed to plasma by removing an electrostatic stacked strap area extending beyond a pedestal tip part. CONSTITUTION: An electrostatic chuck is provided for fixing a semiconductor substrate 8 to a prescribed position within a processing chamber. A non-reactive gas is connected (ported) to an area near the end part of the dielectric part of the chuck through a pedestal to protect the end part of the dielectric part from erosion caused by a processing area.</p>
申请公布号 JPH0855903(A) 申请公布日期 1996.02.27
申请号 JP19950033877 申请日期 1995.02.22
申请人 APPLIED MATERIALS INC 发明人 SHIYAMOIRU SHIYAMOIRIAN;MANUUCHIYAA BIRANGU;SEMIYON SHIYAASUTEINSUKII;SATSUSON SOMEKUU
分类号 B23Q3/15;C23C16/44;C23C16/455;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 B23Q3/15
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