| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus constituted high in reliability of accuracy and a quality of generating image which can reduce pattern inspection time after exposure, and/or re-working amount. <P>SOLUTION: In the lithography apparatus using an array of element possible to be controlled independently, the quality of the generating image is inspected by converting a fraction (portion) of strength of radiation beam patternized by the array of the element, into an image sensor. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
