| 摘要 |
PROBLEM TO BE SOLVED: To prevent an outflow of a liquid from a gap between a peripheral plate and a substrate of a processing device having a nozzle head for feeding and absorbing a developing liquid and having a peripheral plate which surrounds a periphery of the substrate. SOLUTION: A frame-shaped substrate-holding member 10 for supporting a periphery part of a substrate W is provided on a rotating table 2. The member 10 is composed of an absorption holding block 70 and a groove forming block 71. A slit absorbing opening 72 is formed on a horizontal inner periphery surface 70a of the block 70 and can absorb a rear surface of the peripheral part of the substrate W. A groove 80 opened to a gap C between an approach stage 11 and the substrate W to which a liquid is accumulated is formed between a vertical inner periphery surface 71a of a groove forming block 71 and the peripheral surface of the substrate W. The sustained gap C between the running stage 11 and the substrate W satisfactorily transfers the substrate W. No liquid on the running stage 11 and the substrate W outflowing from the gap C can form a liquid film having no space on the running stage 11 and the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI |
